SC-PE-II RF Plasma Cleaning System (13.56 MHz)
$0.00
RF Frequency: Industry-standard 13.56 MHz for stable, high-density, and uniform plasma generation.
Maximum RF Power: 200 W
Power Output Range: 1 – 200 W (Continuously adjustable). Offers exceptional dynamic range, enabling everything from ultra-gentle surface activation for sensitive substrates to aggressive organic ashing.
Process Chamber Dimensions: 150 mm (Diameter) × 185 mm (Depth). High-capacity design, easily accommodating up to 150 mm (6-inch) wafers or multiple bulk samples.
Process Gas Delivery: Dual-channel gas input system (2 dedicated gas lines), allowing for precise introduction and mixing of multiple process gases (e.g., Ar, O2, N2) to customize complex plasma chemistry.
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Orders will be dispatched within 5 working days after payment confirmation, excluding weekends and public holidays. Once shipped, order cancellation or modification is not accepted.
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Returns or refunds for non-quality reasons are not supported. The product comes with a 1-year international warranty. A 2-year extended warranty is available for an additional fee.