Precision Coating & Lithography Solutions
Spin Coating Technology
Spin Coating & Developing System
We put ourselves in the shoes of the researcher. We know that a single micron of deviation can compromise an entire experiment. That is why SETCAS pushes manufacturing standards to the limit. We mandate a rigorous quality control protocol to ensure every unit delivers ±1% coating uniformity, ±1 RPM speed accuracy, and < 0.03mm dynamic balance.
Whether you are equipping a teaching lab or a nanofabrication facility, these standards guarantee consistent, reproducible results every time. We are dedicated to continuously evolving our technology to provide tools that are robust, simple to master, and ready to meet the challenges of your next discovery.
Substrate Size：5-300mm
Speed Range: 50 - 12,000 RPM with precise acceleration control
Programming: Multi-step recipes with visual feedback and adjustable acceleration slopes.
Programmable Multi-Fluid Delivery System: 2-4 Channels
Substrate Protection: Adjustable Vacuum Force for delicate
Connectivity: Full Bluetooth & USB support for remote operation
Chamber : Available in 304 Stainless Steel or PTFE for full chemical resistance
Safety Design: Integrated Anti-Suck Back valve prevents resin from entering the motor
Smart Interaction: 7-inch Touchscreen + Free PC Software for recipe management
Spin Coating Processor
Advanced nanofabrication is a race against contamination and variables. Moving a wet substrate from a coater to a hotplate introduces risks that high-precision research simply cannot afford.
We have evolved the spin coater into a comprehensive process station.
By integrating coating, developing, edge-bead removal (EBR), and baking into a single, environmentally controlled chamber, SETCAS empowers you to execute complex recipes with seamless continuity. This is not just automation; it is process integrity.
Blind processing is a thing of the past. Our processors feature a fully Visualized Chamber design, allowing you to monitor the fluid dynamics of coating and developing in real-time. But we go further than observation. With integrated Auto-Dispense capability and In-Situ Baking, you can program a "Coating-Baking-Cooling" cycle without ever opening the lid. This closed-loop approach minimizes operator error and maximizes the cleanliness of your active layers.
The modern laboratory is connected, and your equipment should be too. The SETCAS Advanced Series is built with a digital-first architecture. Featuring a responsive 7-inch Touchscreen and complimentary Professional PC Software, recipe management becomes effortless. Whether you need to adjust acceleration slopes, toggle motor direction, or log process data, you are in command. With built-in Bluetooth and USB connectivity, you can even operate the system remotely—ideal for glovebox integration or hazardous environment isolation.
Surface Activation & Cleaning
UV Ozone Cleaning System
Atomic-Level Dry Cleaning.
Adhesion failure occurs at the interface. The SETCAS UV Ozone system replaces aggressive wet acids with a dry, atomic-level cleaning process. Powered by a massive 1000W Low-Pressure Mercury Grid, the system emits dual wavelengths for synergistic photolysis: 185nm to generate ozone and 254nm to break carbon bonds. This combination eradicates organic contaminants on a large 760mm x 760mm platform. An integrated heating stage (RT-200°C) accelerates the oxidation reaction, delivering hydrophilic surfaces with zero substrate damage.
RF Plasma Activation System
The 13.56 MHz Gold Standard.
While UV Ozone excels at planar cleaning, complex 3D topologies demand vacuum plasma. Operating at the industrial standard 13.56 MHz, our US-Engineered system generates a high-density, low-temperature plasma for uniform surface modification. Unlike aggressive kHz systems, this frequency acts as a gentle chemical modifier. The High-Purity Quartz Reactor ensures a zero-contamination environment, while the max 50W RF generator offers tunable power logic to scale from gentle TEM grid cleaning to aggressive photoresist ashing.
Linear Deposition Ecosystem
Desktop Slot Die Coater
Bridging the gap between laboratory research and industrial Roll-to-Roll processes, this system enables pre-metered deposition on a desktop scale. Optimized for high-value functional inks like Perovskites, the design minimizes dead volume to save costly precursors while achieving ±1% coating accuracy across a 50mm width. To manage drying kinetics immediately post-deposition, the integrated stage heats up to 200°C, allowing for precise crystallization control of fluids up to 20,000 cp.
Dip Coater
Angstrom-Level Immersion Control.
For Sol-Gel and Layer-by-Layer (LbL) self-assembly applications, velocity stability is non-negotiable. SETCAS eliminates meniscus vibration through a high-torque, micro-stepping motor drive. This architecture allows for an exact 1 μm/s speed resolution across an ultra-wide dynamic range of 1 μm/s to 20,000 μm/s. The system accommodates long substrates up to 300mm and features a built-in RT-200°C heating chamber, enabling "Hot-Dip" protocols where withdrawal rates and drying kinetics are controlled simultaneously.
Automatic Film Applicator
Standardizing Shear Rates.
Manual drawdown testing introduces inconsistent pressure and speed, rendering rheological data unreliable. The SETCAS Automatic Film Applicator removes the "human variable" by replacing manual operation with a motorized, constant-speed traverse. By enforcing a constant speed adjustable between 1 and 500 mm/s, the system standardizes shear rates for reproducible testing. Substrate management is handled by an A4-sized Vacuum Plate with Integrated Heating, ensuring that flexible substrates remain perfectly flat and solvents dry instantly post-application.
Precision Vacuum Hotplates
Hotplate
Thermal gradients are the enemy of yield. Engineered from a solid block of Aerospace-grade Aluminum, the SETCAS system enforces a strict ±0.5°C uniformity standard up to 500°C. The system features a revolutionary Proximity Baking mode, utilizing a motorized lift mechanism with 0-30mm arbitrary positioning. This allows for programmable multi-stage drying recipes that transition from proximity to hard contact, eliminating solvent popping. Built-in Vacuum and Nitrogen purge capabilities ensure oxidation-free curing for sensitive materials.
Magnetron Sputtering
Magnetron Sputtering
Digital Visualization.
Reliable Physical Vapor Deposition (PVD) should not require a facility-scale machine. The SETCAS SC-SU-I brings magnetron sputtering to the desktop, integrating a Quartz Vacuum Chamber and Digital Touch Control to deliver consistent conductive coatings. Replacing imprecise analog gauges, the 4.3-inch Full-Color Touchscreen monitors Vacuum (5 Pa base), Current, and Voltage in real-time. With a deposition rate of 8 nm/min, it provides rapid, repeatable gold or platinum coating for SEM preparation and electrode fabrication.
Mask Aligner
UV LED Mask Aligner
Cold-Light Fidelity.
Precision lithography relies on thermal neutrality. The SETCAS SC-MA-I replaces legacy mercury arc lamps with a state-of-the-art 365nm UV LED Cold Light Source. By decoupling exposure energy from thermal load, we eliminate mask run-out and substrate deformation. The system features highly collimated optics with a divergence angle of < 3°, ensuring the steep, vertical sidewalls essential for lift-off processes. Capable of resolving features down to 1 μm, the mechanical stage supports secondary and multi-layer alignment for complex MEMS device fabrication.
